Characterization of stray light of ArF lithographic tools : Modeling of power spectral density of an optical pupilKIM, Young-Chang; DE BISSCHOP, Peter; VANDENBERGHE, Geert et al.Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 643-646, issn 0167-9317, 4 p.Conference Paper

The 35th International Conference on Micro- and Nano-Engineering (MNE), 28 September-1 October, 2009, Ghent, BelgiumRONSE, Kurt; VAN THOURHOUT, Dries; DE GENDT, Stefan et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, issn 0167-9317, 974 p.Conference Proceedings

Reticle quality needs for advanced 193nm lithographyJONCKHEERE, Rik; VANDENBERGHE, Geert; WIAUX, Vincent et al.SPIE proceedings series. 2001, pp 108-117, isbn 0-8194-4111-2Conference Paper

Acid diffusion effects between resists in freezing processes used for contact hole patterningFUHRMANN, Jürgen; FIEBACH, André; ERDMANN, Andreas et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 951-954, issn 0167-9317, 4 p.Conference Paper

An experimental investigation of the surface potential in ferroelectric P(VDF-TrFE) FETsRUSU, Alexandru; SALVATORE, Giovanni; IONESCU, Adrian et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1607-1609, issn 0167-9317, 3 p.Conference Paper

Bacterial adhesion to toroidal nano-structures from poly(styrene)-block-poly(tert-butyl acrylate) diblock copolymer thin filmsSHUYAN LI; KOMAROMY, Andras Z; NICOLAU, Dan V et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 715-718, issn 0167-9317, 4 p.Conference Paper

CMOS integrated radio frequency dome resonatorWENZHE ZHOU; CROSS, Joshua D; ZALALUTDINOV, Maxim et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1220-1222, issn 0167-9317, 3 p.Conference Paper

Confined VLS growth and structural characterization of silicon nanoribbonsLECESTRE, A; DUBOIS, E; VILLARET, A et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1522-1526, issn 0167-9317, 5 p.Conference Paper

Development of a low temperature amorphous Si/Ti for integrated MEMS/NEMSLIUDI JIANG; LEWIS, G; SPEARING, S. M et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1259-1262, issn 0167-9317, 4 p.Conference Paper

Double-fin FETs based on standard CMOS approachZABOROWSKI, Michał; TOMASZEWSKI, Daniel; PANAS, Andrzej et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1396-1399, issn 0167-9317, 4 p.Conference Paper

Effects of substrate nanopatterning on human osteosarcoma cells (SaOs-2) behaviorBAKEINE, G. J; BENEDETTI, L; GALLI, D et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 830-833, issn 0167-9317, 4 p.Conference Paper

Electrostatic rotator for alignment purposes in multi electron beam systemsZONNEVYLLE, A. C; HEERKENS, C. Th. H; KRUIT, P et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1095-1099, issn 0167-9317, 5 p.Conference Paper

Embedding of single-wall carbon nanotubes into nanopores of porous alumina by electrophoresisKURASHIMA, Yuichi; SHIMADA, Shouta; TANAKA, Takeshi et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1516-1518, issn 0167-9317, 3 p.Conference Paper

Experimental Study of Effect of Pellicle on optical Proximity Fingerprint for 1.35 NA immersion ArF LithographyVAN LOOK, Lieve; BEKAERT, Joost; LAENENS, Bart et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76401Y.1-76401Y.10, 2Conference Paper

Fabrication of a 3D stamp with the micro- and nano-scale patterns through combined NIL and optical lithography processesPARK, Sooyeon; KIM, Geehong; CHOI, Keebong et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 968-971, issn 0167-9317, 4 p.Conference Paper

Fabrication of diffraction grating in polydimethylsiloxane using femtosecond-pulsed laser micromachiningCHANG, Tien-Li; LUO, Shao-Wei; YANG, Han-Ping et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1344-1347, issn 0167-9317, 4 p.Conference Paper

Fabrication of plastic microchips with gold microelectrodes using techniques of sacrificed substrate and thermally activated solvent bondingSVOBODA, Miloš; SLOUKA, Zdeněk; SCHROTT, Walter et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1590-1593, issn 0167-9317, 4 p.Conference Paper

Generation of metal patterns by topography-directed depositionDIANPENG QI; NAN LU; BINGJIE YANG et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1509-1511, issn 0167-9317, 3 p.Conference Paper

Highly photostable solid-state organic distributed feedback laser fabricated via thermal nanoimprint lithographyTRABADELO, V; JUARROS, A; RETOLAZA, A et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1428-1430, issn 0167-9317, 3 p.Conference Paper

Influence of pin chuck ring seals and polishing steps on wafer flatnessUNE, Atsunobu; YOSHITOMI, Kenichiro; MOCHIDA, Masaaki et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1646-1649, issn 0167-9317, 4 p.Conference Paper

Influence of process parameters on hydrogen silsesquioxane chemistry at low voltage electron beam exposuresRIO, David; SIEGERT, Laurent; DERROUGH, Samir et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 914-917, issn 0167-9317, 4 p.Conference Paper

Influence of the dose distribution on resist development propertiesKNYAZEV, M. A; SVINTSOV, A. A; ZAITSEV, S. I et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 880-882, issn 0167-9317, 3 p.Conference Paper

Influence of the electrode radius on the impedance spectra of cell-covered disc electrodeCHO, Sungbo; THIELECKE, Hagen.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 719-721, issn 0167-9317, 3 p.Conference Paper

Inverted tapered pillars for mass sensingMELLI, Mauro; POZZATO, Alessandro; LAZZARINO, Marco et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 730-733, issn 0167-9317, 4 p.Conference Paper

Lithography scaling issues associated with III-V MOSFETsIGNATOVA, O; THOMS, S; JANSEN, W et al.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1049-1051, issn 0167-9317, 3 p.Conference Paper